[llvm] [RISCV] AddEdge between first mask producer and user of V0 (PR #146855)
Pengcheng Wang via llvm-commits
llvm-commits at lists.llvm.org
Thu Jul 3 20:01:09 PDT 2025
================
@@ -68,11 +68,33 @@ class RISCVVectorMaskDAGMutation : public ScheduleDAGMutation {
void apply(ScheduleDAGInstrs *DAG) override {
SUnit *NearestUseV0SU = nullptr;
+ SmallVector<SUnit *, 8> DefMask;
for (SUnit &SU : DAG->SUnits) {
const MachineInstr *MI = SU.getInstr();
- if (MI->findRegisterUseOperand(RISCV::V0, TRI))
+ if (RISCVII::getLMul(MI->getDesc().TSFlags) != RISCVVType::LMUL_8 &&
----------------
wangpc-pp wrote:
Do we really need this LMUL8 constraint here?
https://github.com/llvm/llvm-project/pull/146855
More information about the llvm-commits
mailing list