[flang-dev] Code formatting alignment with LLVM

[Johannes Doerfert via flang-dev]

On 02/13, David Truby via flang-dev wrote:
> Hi all,
> 
> Tim Kieth from Nvidia has provided a specific example from the recent
> FIR pull request where the indentation rules caused spurious diffs
> (see this comment:
> https://github.com/flang-compiler/f18/pull/945#issuecomment-585856610).
> 
> I'm curious if this is also something that shows up badly in
> Phabricator or if that has a better way of showing diffs involving
> whitespace. Is anyone familiar enough with Phabricator to comment on
> this? I wonder if Phabricator might just be better at handling code
> reviews of this ilk better, meaning that this problem is less visible
> to clang/llvm developers.
> 

Here is the diff:
https://reviews.llvm.org/differential/diff/244525/

What line numbers are we looking at again?


> Thanks
> David Truby
> 
> ________________________________
> From: flang-dev <flang-dev-bounces at lists.llvm.org> on behalf of David Truby via flang-dev <flang-dev at lists.llvm.org>
> Sent: 11 February 2020 10:20
> To: flang-dev at lists.llvm.org <flang-dev at lists.llvm.org>
> Subject: [flang-dev] Code formatting alignment with LLVM
> 
> Hi all,
> 
> We have been having a discussion on the GitHub issue tracker about code formatting (and specifically clang-format settings) and whether to align closer with the rest of the project, which you can find here: https://github.com/flang-compiler/f18/pull/945. Since the discussion there hasn’t moved much recently I’d like to start a discussion here so we can get input from a wider group of people.
> 
> My opinion is that regardless of technical preferences we shouldn’t diverge from the style of the rest of the project as much as we currently do, or at least if we want to do that then we should have a discussion with the wider community about whether that is acceptable to them.
> 
> Does anyone else have any input on this?
> 
> Thanks
> David Truby

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-- 

Johannes Doerfert
Researcher

Argonne National Laboratory
Lemont, IL 60439, USA

jdoerfert at anl.gov
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